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Vacuum hot pressing furnace material introduction
Vacuum hot pressing furnace material introduction
Categories: Textile machine / Machine fittings
Usage: Vacuum hot pressing furnace material introduction
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Country/Region : China China
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Description
Vacuum hot pressing furnace material introduction: The target has lower resistivity, higher thermal conductivity and higher mechanical strength. High-density targets can sputter on glass substrates at lower temperatures to obtain conductive films with lower resistivity and higher transmittance, and even ITO conductive films on organic materials.

Preparation of ITO Targets

High performance ITO targets must have the following properties:

1. High density, the relative density of commercial products should be at least 98%, and the density of high-end products should be about 99.5%.

2. High heat shock resistance;

3. Organizational homogeneity without segregation;

4. Fine and uniform grain size;

5. The purity reached 99.99%.

At present, the production technology and equipment of ITO target materials are mature and stable. The main preparation methods are atmospheric sintering, hot isostatic pressing, vacuum hot pressing and cold isostatic pressing.

Email: haoyue@haoyue-group.com
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